Python package for EDA / lithography mask design.
Jan Petykiewicz
bece3136be
Note MAJOR incompatibilities with previous version, including - order of Pattern() args - save format - i/o functions |
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examples | ||
masque | ||
.gitignore | ||
LICENSE.md | ||
MANIFEST.in | ||
README.md | ||
setup.py |
Masque README
Masque is a Python module for designing lithography masks.
The general idea is to implement something resembling the GDSII file-format, but with some vectorized element types (eg. circles, not just polygons), better support for E-beam doses, and the ability to output to multiple formats.
Installation
Requirements:
- python >= 3.5 (written and tested with 3.6)
- numpy
- matplotlib (optional, used for
visualization
functions andtext
) - python-gdsii (optional, used for
gdsii
i/o) - svgwrite (optional, used for
svg
output) - freetype (optional, used for
text
)
Install with pip:
pip3 install 'masque[visualization,gdsii,svg,text]'
Alternatively, install from git
pip3 install git+https://mpxd.net/code/jan/masque.git@release
TODO
- Polygon de-embedding
- Construct from bitmap
- Boolean operations on polygons (using pyclipper)
- Output to OASIS (using fatamorgana)