Python package for EDA / lithography mask design.
Jan Petykiewicz
64b8e4dec8
Since the different patterns we are handed might reference the same Patterns, we have to deepcopy the entire list at once so that we don't make multiple copies of them. |
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examples | ||
masque | ||
.gitignore | ||
LICENSE.md | ||
MANIFEST.in | ||
README.md | ||
setup.py |
Masque README
Masque is a Python module for designing lithography masks.
The general idea is to implement something resembling the GDSII file-format, but with some vectorized element types (eg. circles, not just polygons), better support for E-beam doses, and the ability to output to multiple formats.
Installation
Requirements:
- python >= 3.5 (written and tested with 3.6)
- numpy
- matplotlib (optional, used for
visualization
functions andtext
) - python-gdsii (optional, used for
gdsii
i/o) - svgwrite (optional, used for
svg
output) - freetype (optional, used for
text
)
Install with pip:
pip3 install 'masque[visualization,gdsii,svg,text]'
Alternatively, install from git
pip3 install git+https://mpxd.net/code/jan/masque.git@release
TODO
- Polygon de-embedding
- Construct from bitmap
- Boolean operations on polygons (using pyclipper)
- Output to OASIS (using fatamorgana)