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jan 2022-07-07 11:37:54 -07:00
parent 51b7021bdc
commit eb03935948
1 changed files with 73 additions and 71 deletions
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setup.py
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@ -9,75 +9,77 @@ with open('README.md', 'rt') as f:
with open('masque/VERSION.py', 'rt') as f: with open('masque/VERSION.py', 'rt') as f:
version = f.readlines()[2].strip() version = f.readlines()[2].strip()
setup(name='masque', setup(
version=version, name='masque',
description='Lithography mask library', version=version,
long_description=long_description, description='Lithography mask library',
long_description_content_type='text/markdown', long_description=long_description,
author='Jan Petykiewicz', long_description_content_type='text/markdown',
author_email='jan@mpxd.net', author='Jan Petykiewicz',
url='https://mpxd.net/code/jan/masque', author_email='jan@mpxd.net',
packages=find_packages(), url='https://mpxd.net/code/jan/masque',
package_data={ packages=find_packages(),
'masque': ['py.typed', package_data={
] 'masque': [
}, 'py.typed',
install_requires=[ ],
'numpy', },
'klamath>=1.0', install_requires=[
], 'numpy>=1.21',
extras_require={ 'klamath>=1.0',
'gdsii': ['python-gdsii'], ],
'oasis': ['fatamorgana>=0.7'], extras_require={
'dxf': ['ezdxf'], 'gdsii': ['python-gdsii'],
'svg': ['svgwrite'], 'oasis': ['fatamorgana>=0.11'],
'visualization': ['matplotlib'], 'dxf': ['ezdxf'],
'text': ['freetype-py', 'matplotlib'], 'svg': ['svgwrite'],
}, 'visualization': ['matplotlib'],
classifiers=[ 'text': ['freetype-py', 'matplotlib'],
'Programming Language :: Python :: 3', },
'Development Status :: 4 - Beta', classifiers=[
'Intended Audience :: Developers', 'Programming Language :: Python :: 3',
'Intended Audience :: Information Technology', 'Development Status :: 4 - Beta',
'Intended Audience :: Manufacturing', 'Intended Audience :: Developers',
'Intended Audience :: Science/Research', 'Intended Audience :: Information Technology',
'License :: OSI Approved :: GNU Affero General Public License v3', 'Intended Audience :: Manufacturing',
'Topic :: Scientific/Engineering :: Electronic Design Automation (EDA)', 'Intended Audience :: Science/Research',
'Topic :: Scientific/Engineering :: Visualization', 'License :: OSI Approved :: GNU Affero General Public License v3',
], 'Topic :: Scientific/Engineering :: Electronic Design Automation (EDA)',
keywords=[ 'Topic :: Scientific/Engineering :: Visualization',
'layout', ],
'design', keywords=[
'CAD', 'layout',
'EDA', 'design',
'electronics', 'CAD',
'photonics', 'EDA',
'IC', 'electronics',
'mask', 'photonics',
'pattern', 'IC',
'drawing', 'mask',
'lithography', 'pattern',
'litho', 'drawing',
'geometry', 'lithography',
'geometric', 'litho',
'polygon', 'geometry',
'curve', 'geometric',
'ellipse', 'polygon',
'oas', 'curve',
'gds', 'ellipse',
'dxf', 'oas',
'svg', 'gds',
'OASIS', 'dxf',
'gdsii', 'svg',
'gds2', 'OASIS',
'convert', 'gdsii',
'stream', 'gds2',
'custom', 'convert',
'visualize', 'stream',
'vector', 'custom',
'freeform', 'visualize',
'manhattan', 'vector',
'angle', 'freeform',
], 'manhattan',
) 'angle',
],
)