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Remove support for dose

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Since there isn't GDS/OASIS level support for dose, this can be mostly
handled by using arbitrary layers/dtypes directly. Dose scaling isn't
handled as nicely that way, but it corresponds more directly to what
gets written to file.
This commit is contained in:
Jan Petykiewicz 2023-01-18 18:14:33 -08:00 • committed by jan
commit c7f3e7ee52
18 changed files with 57 additions and 340 deletions
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masque/__init__.py
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@ -3,8 +3,8 @@
masque is an attempt to make a relatively small library for designing lithography
masks. The general idea is to implement something resembling the GDSII and OASIS file-formats,
but with some additional vectorized element types (eg. ellipses, not just polygons), better
support for E-beam doses, and the ability to interface with multiple file formats.
but with some additional vectorized element types (eg. ellipses, not just polygons), and the
ability to interface with multiple file formats.
`Pattern` is a basic object containing a 2D lithography mask, composed of a list of `Shape`
objects, a list of `Label` objects, and a list of references to other `Patterns` (using