49 lines
1.1 KiB
TOML
49 lines
1.1 KiB
TOML
|
[build-system]
|
||
|
|
requires = ["hatchling"]
|
||
|
|
build-backend = "hatchling.build"
|
||
|
|
|
||
|
|
[project]
|
||
|
|
name = "lethe"
|
||
|
|
description = "Lithography mask library"
|
||
|
|
readme = "README.md"
|
||
|
|
license = { file = "LICENSE.md" }
|
||
|
|
authors = [
|
||
|
|
{ name="Jan Petykiewicz", email="jan@mpxd.net" },
|
||
|
|
]
|
||
|
|
homepage = "https://mpxd.net/code/jan/lethe"
|
||
|
|
repository = "https://mpxd.net/code/jan/lethe"
|
||
|
|
keywords = [
|
||
|
|
"git",
|
||
|
|
"snapshot",
|
||
|
|
"commit",
|
||
|
|
"refs",
|
||
|
|
"backup",
|
||
|
|
"undo",
|
||
|
|
"log",
|
||
|
|
"lab notebook",
|
||
|
|
"traceability",
|
||
|
|
]
|
||
|
|
classifiers = [
|
||
|
|
"Programming Language :: Python :: 3",
|
||
|
|
"Development Status :: 4 - Beta",
|
||
|
|
"Environment :: Other Environment",
|
||
|
|
"Intended Audience :: Developers",
|
||
|
|
"Intended Audience :: Science/Research",
|
||
|
|
"License :: OSI Approved :: GNU General Public License v3 (GPLv3)",
|
||
|
|
"Topic :: Software Development :: Version Control :: Git",
|
||
|
|
"Topic :: Utilities",
|
||
|
|
]
|
||
|
|
requires-python = ">=3.8"
|
||
|
|
dynamic = ["version"]
|
||
|
|
dependencies = [
|
||
|
|
]
|
||
|
|
|
||
|
|
|
||
|
|
[tool.hatch.version]
|
||
|
|
path = "lethe/__init__.py"
|
||
|
|
|
||
|
|
[project.scripts]
|
||
|
|
lethe = "lethe.endpoints:main"
|
||
|
|
lethe-push = "lethe.endpoints:push"
|
||
|
|
lethe-fetch = "lethe.endpoints:fetch"
|