44 lines
1.8 KiB
Python
44 lines
1.8 KiB
Python
"""
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masque 2D CAD library
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masque is an attempt to make a relatively small library for designing lithography
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masks. The general idea is to implement something resembling the GDSII and OASIS file-formats,
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but with some additional vectorized element types (eg. ellipses, not just polygons), better
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support for E-beam doses, and the ability to interface with multiple file formats.
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`Pattern` is a basic object containing a 2D lithography mask, composed of a list of `Shape`
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objects, a list of `Label` objects, and a list of references to other `Patterns` (using
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`SubPattern`).
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`SubPattern` provides basic support for nesting `Pattern` objects within each other, by adding
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offset, rotation, scaling, repetition, and other such properties to a Pattern reference.
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Note that the methods for these classes try to avoid copying wherever possible, so unless
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otherwise noted, assume that arguments are stored by-reference.
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NOTES ON INTERNALS
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==========================
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- Many of `masque`'s classes make use of `__slots__` to make them faster / smaller.
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Since `__slots__` doesn't play well with multiple inheritance, the `masque.utils.AutoSlots`
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metaclass is used to auto-generate slots based on superclass type annotations.
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- File I/O submodules are imported by `masque.file` to avoid creating hard dependencies on
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external file-format reader/writers
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- Pattern locking/unlocking is quite slow for large hierarchies.
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"""
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from .error import PatternError, PatternLockedError
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from .shapes import Shape
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from .label import Label
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from .subpattern import SubPattern
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from .pattern import Pattern
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from .utils import layer_t, annotations_t
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from .library import Library, DeviceLibrary
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__author__ = 'Jan Petykiewicz'
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__version__ = '2.7'
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version = __version__ # legacy
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