diff --git a/MANIFEST.in b/MANIFEST.in
deleted file mode 100644
index c28ab72..0000000
--- a/MANIFEST.in
+++ /dev/null
@@ -1,2 +0,0 @@
-include README.md
-include LICENSE.md
diff --git a/masque/LICENSE.md b/masque/LICENSE.md
new file mode 120000
index 0000000..7eabdb1
--- /dev/null
+++ b/masque/LICENSE.md
@@ -0,0 +1 @@
+../LICENSE.md
\ No newline at end of file
diff --git a/masque/README.md b/masque/README.md
new file mode 120000
index 0000000..32d46ee
--- /dev/null
+++ b/masque/README.md
@@ -0,0 +1 @@
+../README.md
\ No newline at end of file
diff --git a/masque/VERSION.py b/masque/VERSION.py
deleted file mode 100644
index 6c737da..0000000
--- a/masque/VERSION.py
+++ /dev/null
@@ -1,4 +0,0 @@
-""" VERSION defintion. THIS FILE IS MANUALLY PARSED BY setup.py and REQUIRES A SPECIFIC FORMAT """
-__version__ = '''
-2.7
-'''.strip()
diff --git a/masque/__init__.py b/masque/__init__.py
index 611d4d4..7881bdb 100644
--- a/masque/__init__.py
+++ b/masque/__init__.py
@@ -39,5 +39,5 @@ from .library import Library, DeviceLibrary
 
 __author__ = 'Jan Petykiewicz'
 
-from .VERSION import __version__
+__version__ = '2.7'
 version = __version__       # legacy
diff --git a/pyproject.toml b/pyproject.toml
new file mode 100644
index 0000000..df3235f
--- /dev/null
+++ b/pyproject.toml
@@ -0,0 +1,60 @@
+[build-system]
+requires = ["hatchling"]
+build-backend = "hatchling.build"
+
+[project]
+name = "masque"
+description = "Lithography mask library"
+readme = "README.md"
+license = { file = "LICENSE.md" }
+authors = [
+    { name="Jan Petykiewicz", email="jan@mpxd.net" },
+    ]
+homepage = "https://mpxd.net/code/jan/masque"
+repository = "https://mpxd.net/code/jan/masque"
+keywords = [
+    "layout",
+    "CAD",
+    "EDA",
+    "mask",
+    "pattern",
+    "lithography",
+    "oas",
+    "gds",
+    "dxf",
+    "svg",
+    "OASIS",
+    "gdsii",
+    "gds2",
+    "stream",
+    ]
+classifiers = [
+    "Programming Language :: Python :: 3",
+    "Development Status :: 4 - Beta",
+    "Intended Audience :: Developers",
+    "Intended Audience :: Information Technology",
+    "Intended Audience :: Manufacturing",
+    "Intended Audience :: Science/Research",
+    "License :: OSI Approved :: GNU Affero General Public License v3",
+    "Topic :: Scientific/Engineering :: Electronic Design Automation (EDA)",
+    "Topic :: Scientific/Engineering :: Visualization",
+    ]
+requires-python = ">=3.8"
+dynamic = ["version"]
+dependencies = [
+    "numpy~=1.21",
+    "klamath~=1.2",
+    ]
+
+
+[tool.hatch.version]
+path = "masque/__init__.py"
+
+[project.optional-dependencies]
+oasis = ["fatamorgana~=0.11"]
+dxf = ["ezdxf"]
+svg = ["svgwrite"]
+visualize = ["matplotlib"]
+text = ["matplotlib", "freetype-py"]
+python-gdsii = ["python-gdsii"]
+
diff --git a/setup.py b/setup.py
deleted file mode 100644
index b215f5f..0000000
--- a/setup.py
+++ /dev/null
@@ -1,85 +0,0 @@
-#!/usr/bin/env python3
-
-from setuptools import setup, find_packages
-
-
-with open('README.md', 'rt') as f:
-    long_description = f.read()
-
-with open('masque/VERSION.py', 'rt') as f:
-    version = f.readlines()[2].strip()
-
-setup(
-    name='masque',
-    version=version,
-    description='Lithography mask library',
-    long_description=long_description,
-    long_description_content_type='text/markdown',
-    author='Jan Petykiewicz',
-    author_email='jan@mpxd.net',
-    url='https://mpxd.net/code/jan/masque',
-    packages=find_packages(),
-    package_data={
-        'masque': [
-            'py.typed',
-            ],
-        },
-    install_requires=[
-        'numpy>=1.21',
-        'klamath>=1.0',
-        ],
-    extras_require={
-        'gdsii': ['python-gdsii'],
-        'oasis': ['fatamorgana>=0.11'],
-        'dxf': ['ezdxf'],
-        'svg': ['svgwrite'],
-        'visualization': ['matplotlib'],
-        'text': ['freetype-py', 'matplotlib'],
-        },
-    classifiers=[
-        'Programming Language :: Python :: 3',
-        'Development Status :: 4 - Beta',
-        'Intended Audience :: Developers',
-        'Intended Audience :: Information Technology',
-        'Intended Audience :: Manufacturing',
-        'Intended Audience :: Science/Research',
-        'License :: OSI Approved :: GNU Affero General Public License v3',
-        'Topic :: Scientific/Engineering :: Electronic Design Automation (EDA)',
-        'Topic :: Scientific/Engineering :: Visualization',
-        ],
-    keywords=[
-        'layout',
-        'design',
-        'CAD',
-        'EDA',
-        'electronics',
-        'photonics',
-        'IC',
-        'mask',
-        'pattern',
-        'drawing',
-        'lithography',
-        'litho',
-        'geometry',
-        'geometric',
-        'polygon',
-        'curve',
-        'ellipse',
-        'oas',
-        'gds',
-        'dxf',
-        'svg',
-        'OASIS',
-        'gdsii',
-        'gds2',
-        'convert',
-        'stream',
-        'custom',
-        'visualize',
-        'vector',
-        'freeform',
-        'manhattan',
-        'angle',
-        ],
-    )
-